Kurt J. Lesker Company

Silicon Carbide coated Graphite (SiCg) heater element

No – Select SiCg heater element

Standard heating element. Not recommended for oxidising atmospheres as the heating element will degrade over time.

Solid Silicon Carbide (sSiC) heater element

Yes / Don't Know – Select sSiC heater element

Heating element option. Recommended for use in oxidising atmospheres.

Application Details (required for both EC-I and EC-R series)

To ensure that you receive the correct configuration of EpiCentre it is essential to provide as much information on the potential applications as possible.

If gases or vapours are involved in your process please complete the information below:

Are any of the following materials incompatible with your process?
(please tick all that apply)

None

Tantalum

Copper

Molybdenum

Aluminium

Stainless Steel

Inconel

What is the application?
What substrate materials will you be using?
What is the process chamber's ultimate (base) pressure requirement?
What maximum temperature and pressure do you wish to heat the substrate to in vacuum?
How long do you need to maintain this temperature?

	Gas	Partial Pressure (mbar or torr)	Temperature	Duration
1.
2.
3.
4.
5.
6.

First & Last Name:	Title:	Organization:
Email:	Phone:	Fax:
Street:	City:	State/Province:
Country:	Postal/Zip Code:	Company Type:
Returning KJLC customer?:

EpiCentre Stage Questionnaire

EpiCentre Series Selection

1. Which series do you prefer?

EC-I In-line Design

EC-R Right-angled Design

2. Stage Orientation

3. EC-I Mounting Flange Required

4. EC-I Substrate Size

EpiCentre Configuration & Options

EC-I Configuration

5. Substrate Biasing

6. Substrate Rotation

7. Substrate Rotation Speed

8. Rotation Controller

9. Cradle lift/lower to aid sample transfer

10. Cradle Home Sensor

11. How will samples be transferred?

12. Deposition height adjustment

13. Substrate shutter

14. Heater Shields

15. Deposition Cans

16. Thermocouple

2. EC-R Mounting Flange

3. EC-R Substrate Size

EpiCentre Configuration & Options

EC-R Configuration

4. Polar (Primary) Rotation

5. Substrate Biasing

6. Substrate (Azimuthal) Rotation

7. Substrate Rotation Speed(if substrate rotation option selcted)

8. Rotation Controller

9. Rotation Home Sensor

10. How will samples be transferred?

11. Z-Shift Adjustment

12. XY Motion

13. Thermocouple

EpiCentre Heater Selection (required for both EC-I and EC-R series)

Does the intended process involve the use of high partial pressures of O2?

Silicon Carbide coated Graphite (SiCg) heater element

Solid Silicon Carbide (sSiC) heater element

Temperature controller & power supply?

Application Details (required for both EC-I and EC-R series)

What is the application?

What substrate materials will you be using?

What is the process chamber's ultimate (base) pressure requirement?

What maximum temperature and pressure do you wish to heat the substrate to in vacuum?

How long do you need to maintain this temperature?

If gases or vapours are involved in your process please complete the information below:

Gas

Partial Pressure(mbar or torr)

Temperature

Duration

Are any of the following materials incompatible with your process?(please tick all that apply)

Additional Comments

Related Products

Would you like more information on our range of sample transfer products including:

7. Substrate Rotation Speed
(if substrate rotation option selcted)

Does the intended process involve the use of high partial pressures of O₂?

Partial Pressure
(mbar or torr)

Are any of the following materials incompatible with your process?
(please tick all that apply)